Purdue engineers create model for testing transistor reliability
Physics /
Dec 04, 2004 |
not rated yet |
0
Researchers at Purdue University have created a "unified model" for predicting the reliability of new designs for silicon transistors – a potential tool that industry could use to save tens of millions of dollars annually ...
Applied Materials Launches Breakthrough 45nm PVD Copper Barrier/Seed Technology
Dec 04, 2004 |
not rated yet |
0
Applied Materials, Inc. today introduced the Applied Endura CuBS II, a breakthrough system that enables PVD copper barrier/seed deposition at 45nm and beyond. The system's new SIP EnCoRe II process chambers feature novel, ...
Elpida Memory Develops 90 nm Silicon Wafer Process for High-Performance DDR2 SDRAM
Dec 04, 2004 |
not rated yet |
0
Advanced Process Technology Boosts Production Efficiency for Superior DDR2 Products Elpida Memory, Inc., Japan's leading global supplier of Dynamic Random Access Memory (DRAM), today announced that is has developed its ...
