ASML Ships TWINSCAN XT:1900i Lithography System for Volume Production

ASML today announced that it has shipped its first TWINSCAN XT:1900i, the world’s only lithography system capable of imaging features down to 36.5 nanometers (nm) on chips manufactured in volume. Production of the XT:1900i is now ramping up fast, as multiple orders have been placed and systems will be shipped before the end of this year to many of the world’s leading device makers.

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<p><a href="http://www.physorg.com/news103987615.html">ASML Ships TWINSCAN XT:1900i Lithography System for Volume Production</a></p> <p>ASML today announced that it has shipped its first TWINSCAN XT:1900i, the world’s only lithography system capable of imaging features down to 36.5 nanometers (nm) on chips manufactured in volume. Production of the XT:1900i is now ramping up fast, as multiple orders have been placed and systems will be shipped before the end of this year to many of the world’s leading device makers.</p>