Sematech Reveals Details on Practical High-K Metal Gate Systems for 45nm And Beyond

Building on their successful CMOS solution for gate‑first, thermally stable, high-k dual metal gates, SEMATECH researchers have released further data that portends a new era in which future transistor scaling is dominated by heterogeneous integration of new materials onto silicon.

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<p><a href="http://www.physorg.com/news106839479.html">Sematech Reveals Details on Practical High-K Metal Gate Systems for 45nm And Beyond</a></p> <p>Building on their successful CMOS solution for gate‑first, thermally stable, high-k dual metal gates, SEMATECH researchers have released further data that portends a new era in which future transistor scaling is dominated by heterogeneous integration of new materials onto silicon.</p>