Lighter gas reduces damage to optics in extreme ultraviolet lithography

Researchers at the University of Illinois have discovered a way to generate light and reduce damage in a leading candidate for next-generation microelectronics lithography. The technique could help pack more power into smaller computer chips.

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<p><a href="http://www.physorg.com/news108822216.html">Lighter gas reduces damage to optics in extreme ultraviolet lithography</a></p> <p>Researchers at the University of Illinois have discovered a way to generate light and reduce damage in a leading candidate for next-generation microelectronics lithography. The technique could help pack more power into smaller computer chips.</p>