New paper reveals nanoscale details of photolithography process

Scientists at the National Institute of Standards and Technology have made the first direct measurements of the infinitesimal expansion and collapse of thin polymer films used in the manufacture of advanced semiconductor devices. It’s a matter of only a couple of nanometers, but it can be enough to affect the performance of next-generation chip manufacturing. The NIST measurements, detailed in a new paper, offer a new insight into the complex chemistry that enables the mass production of powerful new integrated circuits.

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