IBM Alliances Announce Advancement in High-K/Metal Gate Technology

IBM and its joint development partners -- AMD, Chartered Semiconductor Manufacturing, Freescale, Infineon, and Samsung -- announced an innovative approach to speed the implementation of a breakthrough material known as "high-k/metal gate" in next generation 32 nanometer (32nm) computer chips.

If you want to include this story in your blog, copy and paste this formatted text:

<p><a href="http://www.physorg.com/news116860211.html">IBM Alliances Announce Advancement in High-K/Metal Gate Technology</a></p> <p>IBM and its joint development partners -- AMD, Chartered Semiconductor Manufacturing, Freescale, Infineon, and Samsung -- announced an innovative approach to speed the implementation of a breakthrough material known as "high-k/metal gate" in next generation 32 nanometer (32nm) computer chips.</p>