SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL)—pushing the technology another significant step toward readiness for advanced manufacturing.

If you want to include this story in your blog, copy and paste this formatted text:

<p><a href="http://www.physorg.com/news121963804.html">SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal</a></p> <p>Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL)—pushing the technology another significant step toward readiness for advanced manufacturing. </p>