Toshiba develops cost-effective 32nm CMOS platform technology by advanced single exposure lithography

Toshiba Corporation today announced a cost-effective 32nm CMOS platform technology that offers higher density and improved performance while halving the cost per function from 45nm technology.

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<p><a href="http://www.physorg.com/news148843305.html">Toshiba develops cost-effective 32nm CMOS platform technology by advanced single exposure lithography</a></p> <p>Toshiba Corporation today announced a cost-effective 32nm CMOS platform technology that offers higher density and improved performance while halving the cost per function from 45nm technology.</p>