New method could lead to narrower chip patterns

(PhysOrg.com) -- Researchers at MIT have found a novel method for etching extremely narrow lines on a microchip, using a material that can be switched from transparent to opaque, and vice versa, just by exposing it to certain wavelengths of light.

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<p><a href="http://www.physorg.com/news158582784.html">New method could lead to narrower chip patterns</a></p> <p>(PhysOrg.com) -- Researchers at MIT have found a novel method for etching extremely narrow lines on a microchip, using a material that can be switched from transparent to opaque, and vice versa, just by exposing it to certain wavelengths of light.</p>