Elpida Memory Expands Semiconductor Production Facilities

Construction Begins on Second 300 mm Fabrication Plant and First 300 mm Fab Set to Boost Mass Production
Hiroshima, June 10, 2004 - Elpida Memory, Inc (Elpida), Japan's leading global supplier of Dynamic Random Access Memory (DRAM), and Hiroshima Elpida Memory, Inc (Hiroshima Elpida), today announced that they have started construction on a second 300 mm wafer fabrication facility. Hiroshima Elpida's first 300 mm facility will also expand its production capacity. Both activities are part Elpida's strategy to expand its semiconductor mass production to meet growing customer demand for leading-edge, high-performance DRAM products.

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<p><a href="http://www.physorg.com/news185.html">Elpida Memory Expands Semiconductor Production Facilities</a></p> <p><b><i>Construction Begins on Second 300 mm Fabrication Plant and First 300 mm Fab Set to Boost Mass Production</i></b> <br />Hiroshima, June 10, 2004 - Elpida Memory, Inc (Elpida), Japan's leading global supplier of Dynamic Random Access Memory (DRAM), and Hiroshima Elpida Memory, Inc (Hiroshima Elpida), today announced that they have started construction on a second 300 mm wafer fabrication facility. Hiroshima Elpida's first 300 mm facility will also expand its production capacity. Both activities are part Elpida's strategy to expand its semiconductor mass production to meet growing customer demand for leading-edge, high-performance DRAM products.</p>