First EVG UV Nanoimprint step&repeat lithography system will be delivered to AMO

EV Group launches a step-and-repeat nanoimprint lithography system for industrial fabrication of nanoscale devices

EV Group (EVG), a leading manufacturer of MEMS, nano and semiconductor wafer-processing equipment, said today it will install a fully automated, ultra-violet step-and-repeat nanoimprint lithography (UV-NIL) system at AMO GmbH (AMO) in Germany.
UV-NIL is a next-generation lithography technology and a contender to succeed optical lithography for the 32-nm node, according to the International Technology Roadmap of Semiconductor (ITRS). Applications include integrated photonic devices, nanoelectronics, life sciences, patterned media and nextgeneration memories.

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<p><a href="http://www.physorg.com/news2373.html">First EVG UV Nanoimprint step&repeat lithography system will be delivered to AMO</a></p> <p><b><i>EV Group launches a step-and-repeat nanoimprint lithography system for industrial fabrication of nanoscale devices </b></i> <br> <br>EV Group (EVG), a leading manufacturer of MEMS, nano and semiconductor wafer-processing equipment, said today it will install a fully automated, ultra-violet step-and-repeat nanoimprint lithography (UV-NIL) system at AMO GmbH (AMO) in Germany. <br>UV-NIL is a next-generation lithography technology and a contender to succeed optical lithography for the 32-nm node, according to the International Technology Roadmap of Semiconductor (ITRS). Applications include integrated photonic devices, nanoelectronics, life sciences, patterned media and nextgeneration memories.</p>