Alternative Strategies May Supplant Low-k Materials Development for Future ICs

The search for low-k materials to improve semiconductor interconnects may have reached certain practical limits, according to technologists at a recent conference sponsored by SEMATECH. Future work likely will focus less on new, ultra low-k materials, and more on enhancing improvements in process and design, conference participants indicated.
Presenters at the SEMATECH Low-k Symposium, which attracted approximately 140 technologists to San Diego in late October, appeared to sustain SEMATECH's position that interconnect materials below 2.5 k-effective may be too expensive to develop and too difficult to work with to be economically practical for all design schemes.

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<p><a href="http://www.physorg.com/news2480.html">Alternative Strategies May Supplant Low-k Materials Development for Future ICs</a></p> <p>The search for <a class="directory" href="http://www.physorg.com/search/low-k">low-k</a> materials to improve semiconductor interconnects may have reached certain practical limits, according to technologists at a recent conference sponsored by SEMATECH. Future work likely will focus less on new, ultra low-k materials, and more on enhancing improvements in process and design, conference participants indicated. <br>Presenters at the SEMATECH Low-k Symposium, which attracted approximately 140 technologists to San Diego in late October, appeared to sustain SEMATECH's position that interconnect materials below 2.5 k-effective may be too expensive to develop and too difficult to work with to be economically practical for all design schemes.</p>