TSMC Verifies Fully Functional 90 Nanometer Chips Using Immersion Lithography Tools

Findings Suggests Immersion is Nearly Ready For Production

Taiwan Semiconductor Manufacturing Company, said that it used immersion lithography tools to produce fully functional 90nm devices. The finding was presented in a keynote speech at the Cymer Lithography Symposium in Semicon Japan on December 1, predating a similar announcement.
TSMC's circuits represent the first data that immersion-based lithography systems are nearing production-ready status.

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<p><a href="http://www.physorg.com/news2484.html">TSMC Verifies Fully Functional 90 Nanometer Chips Using Immersion Lithography Tools</a></p> <p><b><i>Findings Suggests Immersion is Nearly Ready For Production</b></i> <br> <br>Taiwan Semiconductor Manufacturing Company, said that it used immersion lithography tools to produce fully functional 90nm devices. The finding was presented in a keynote speech at the Cymer Lithography Symposium in Semicon Japan on December 1, predating a similar announcement. <br>TSMC's circuits represent the first data that immersion-based <a class="directory" href="http://www.physorg.com/search/lithography">lithography</a> systems are nearing production-ready status.</p>