Cymer partners with IMEC on immersion lithography

Cymer, Inc., the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC’s 300 mm wafer fab facility in Leuven, Belgium. The tool integration marks the first milestone in the company’s participation in IMEC’s Industrial Affiliation Program (IIAP) on Advanced Lithography - aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.

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<p><a href="http://www.physorg.com/news2809.html">Cymer partners with IMEC on immersion lithography</a></p> <p>Cymer, Inc., the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC’s 300 mm wafer fab facility in Leuven, Belgium. The tool integration marks the first milestone in the company’s participation in IMEC’s Industrial Affiliation Program (IIAP) on Advanced Lithography - aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.</p>