OnWafer Launches Latest Wireless SensorWafer Product Designed to Deliver Unmatched Process Control for Sub-100-nm Photol

In a move designed to further extend its leadership in process zone control, OnWafer Technologies kicked off the 35th annual SPIE Microlithography 2005 conference by announcing its fourth-generation (G4) wireless BakeTemp SensorWafer product, which is designed to monitor and control sub-100-nm photolithography process applications. This latest product offers significant improvements in manufacturing technology and upgraded electronics -- delivering higher resolution and increased accuracy through a 50 percent increase in sensor density, while extending lifetime.

If you want to include this story in your blog, copy and paste this formatted text:

<p><a href="http://www.physorg.com/news3345.html">OnWafer Launches Latest Wireless SensorWafer Product Designed to Deliver Unmatched Process Control for Sub-100-nm Photol</a></p> <p>In a move designed to further extend its leadership in process zone control, OnWafer Technologies kicked off the 35th annual SPIE Microlithography 2005 conference by announcing its fourth-generation (G4) wireless BakeTemp SensorWafer product, which is designed to monitor and control sub-100-nm photolithography process applications. This latest product offers significant improvements in manufacturing technology and upgraded electronics -- delivering higher resolution and increased accuracy through a 50 percent increase in sensor density, while extending lifetime. </p>