Researchers develop detailed design rules for nanoimprint lithography processing

Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography in patterning integrated circuits and other small-scale structures into polymers.

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<p><a href="http://www.physorg.com/news65094894.html">Researchers develop detailed design rules for nanoimprint lithography processing</a></p> <p>Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography in patterning integrated circuits and other small-scale structures into polymers.</p>