SEMATECH and Synopsys to Develop Advanced OPC Models For 45 nm and Below Immersion Lithography

Synopsys, Inc. and SEMATECH today announced a joint program to develop advanced optical proximity correction (OPC) models that will enable the extension of optical lithography.

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<p><a href="http://www.physorg.com/news6963.html">SEMATECH and Synopsys to Develop Advanced OPC Models For 45 nm and Below Immersion Lithography</a></p> <p>Synopsys, Inc. and SEMATECH today announced a joint program to develop advanced optical proximity correction (OPC) models that will enable the extension of optical lithography.</p>