Optical Lithography Refinement Essential to Meet Increasing Challenge from NGL Technologies

Optical lithography may currently offer the advantage of high wafer throughputs, but to sustain in the long term and compete with the next generation lithography (NGL) technologies, it must deliver finer resolution and achieve the desired quality, reliability, and cost targets.

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<p><a href="http://www.physorg.com/news773.html">Optical Lithography Refinement Essential to Meet Increasing Challenge from NGL Technologies</a></p> <p>Optical <a class="directory" href="http://www.physorg.com/search/lithography">lithography</a> may currently offer the advantage of high <a class="directory" href="http://www.physorg.com/search/wafer">wafer</a> throughputs, but to sustain in the long term and compete with the <b>next generation lithography (NGL) technologies</b>, it must deliver finer resolution and achieve the desired quality, reliability, and cost targets.</p>