Improved Materials Dominate Chip Evolution

Material innovation has replaced scaling as the primary source of performance and feature improvements in leading-edge CMOS semiconductors, IBM technologist Paul Farrar, Jr. told attendees at the ISMI Symposium on Manufacturing Effectiveness recently.

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<p><a href="http://www.physorg.com/news7859.html">Improved Materials Dominate Chip Evolution</a></p> <p>Material innovation has replaced scaling as the primary source of performance and feature improvements in leading-edge CMOS semiconductors, IBM technologist Paul Farrar, Jr. told attendees at the ISMI Symposium on Manufacturing Effectiveness recently.</p>