Engineers Devise New Method of Chemical Vapor Deposition for Smaller Nanostructures

Engineers at the California Institute of Technology have invented an ingenious new method for depositing tiny amounts of materials on surfaces. The researchers say that the technique, known as plasmon-assisted chemical vapor deposition, will add a powerful new tool to the existing battery of techniques used to construct microdevices.

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<p><a href="http://www.physorg.com/news80403538.html">Engineers Devise New Method of Chemical Vapor Deposition for Smaller Nanostructures</a></p> <p>Engineers at the California Institute of Technology have invented an ingenious new method for depositing tiny amounts of materials on surfaces. The researchers say that the technique, known as plasmon-assisted chemical vapor deposition, will add a powerful new tool to the existing battery of techniques used to construct microdevices.</p>