ASML Impacts Industry Roadmap with Immersion and EUV Achievements for 45 nm and Beyond

ASML Holding NV today announced significant progress towards development of both high NA immersion and Extreme Ultra Violet (EUV) lithography technology: two critical elements of the semiconductor industry’s ability to continue its historical trend of packing more power onto silicon chips.

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<p><a href="http://www.physorg.com/news8800.html">ASML Impacts Industry Roadmap with Immersion and EUV Achievements for 45 nm and Beyond</a></p> <p>ASML Holding NV today announced significant progress towards development of both high NA immersion and Extreme Ultra Violet (EUV) lithography technology: two critical elements of the semiconductor industry’s ability to continue its historical trend of packing more power onto silicon chips.</p>