Research on Novel Materials Holds Key to Extending Immersion Lithography

The future of 193 nm immersion (193i) lithography will be driven by the demonstration of a high-index lens material, invention of a third generation immersion fluid, and development of a high-index photoresist, Sematech-sponsored scientists reported at last week’s SPIE Advanced Lithography Symposium.

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<p><a href="http://www.physorg.com/news92671508.html">Research on Novel Materials Holds Key to Extending Immersion Lithography</a></p> <p>The future of 193 nm immersion (193i) lithography will be driven by the demonstration of a high-index lens material, invention of a third generation immersion fluid, and development of a high-index photoresist, Sematech-sponsored scientists reported at last week’s SPIE Advanced Lithography Symposium. </p>