Albany NanoTech Pioneers 193nm Immersion Lithography R&D with ASML, IBM, TEL, AMD and Infineon

Albany NanoTech of the University at Albany-State University of New York announced today that its College for Nanoscale Science and Engineering (CSNE) has installed and begun qualifying for 300mm wafers using the world’s first 193nm pre-production immersion lithography system.

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<p><a href="http://www.physorg.com/news957.html">Albany NanoTech Pioneers 193nm Immersion Lithography R&D with ASML, IBM, TEL, AMD and Infineon</a></p> <p>Albany NanoTech of the University at Albany-State University of New York announced today that its College for Nanoscale Science and Engineering (CSNE) has installed and begun qualifying for 300mm wafers using the world’s first 193nm pre-production immersion lithography system. <br /></p>