Solutions Emerging for Wafer Cleaning at 45 nm and Beyond

Potential solutions are starting to emerge for preparing wafers for manufacturing at and beyond the 45 nm technology generation, technologists indicated at a recent industry meeting organized by SEMATECH.

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<p><a href="http://www.physorg.com/news98977769.html">Solutions Emerging for Wafer Cleaning at 45 nm and Beyond</a></p> <p>Potential solutions are starting to emerge for preparing wafers for manufacturing at and beyond the 45 nm technology generation, technologists indicated at a recent industry meeting organized by SEMATECH.</p>