Atomic layer deposition fuels future solutions to nation's energy challenges

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The three images illustrate how a combination of anodized aluminum oxide (AAO) and atomic layer deposition (ALD) provides precisely controlled ultra-uniform porous support for new and well-defined catalysts. Credit: ANL
The three images illustrate how a combination of anodized aluminum oxide (AAO) and atomic layer deposition (ALD) provides precisely controlled, ultra-uniform porous support for new and well-defined catalysts. Credit: ANL
More efficient and less costly solar cells, solid-state lighting and industrial catalysts are potential applications of atomic layer deposition (ALD), a technique that researchers at Argonne National Laboratory are working to perfect. Other potential applications are improved superconductors and separation membranes.


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All News summaries for July 23, 2007

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