SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

User rating: 2 / 5 after 1 vote(s)

Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL)—pushing the technology another significant step toward readiness for advanced manufacturing.


Full story »
All News summaries from Technology news
All News summaries for February 11, 2008

Hackers get hold of critical Internet flaw (Update)

10 hours ago | User rating: not rated yet
Internet security researchers on Thursday warned that hackers have caught on to a "critical" flaw that lets them control traffic on the Internet.

Microsoft shakes up online division and deepens Facebook ties (Update)

10 hours ago | User rating: not rated yet
Microsoft is shaking up management of its online division and strengthening its tie to Facebook in the aftermath of a failed bid to buy Yahoo to bolster its lagging Internet business.

Major shareholder advisory firm backs Yahoo board

Jul 24, 2008 | User rating: not rated yet
(AP) -- An influential shareholder advisory firm endorsed the re-election of Yahoo Inc.'s entire board Thursday, reducing the chances that the Internet company's directors will be ousted for spurning Microsoft Corp.'s $47.5 ...

Creators of Scrabble knockoff on Facebook sued

Jul 24, 2008 | User rating: not rated yet
(AP) -- T-R-O-U-B-L-E could loom for a Scrabble knockoff that has become one of the most popular activities on Facebook.

Intel Outlines Plans for New Category of Smarter, Purpose-Built 'System on Chip' Designs

Jul 24, 2008 | User rating: not rated yet
As Internet access continues to be added to all kinds of computers and devices, Intel executives outlined a plan to use its chip design expertise, factory capacity, advanced manufacturing techniques and the economics of Moore's ...
Goto Archive PhysOrg Forum Goto Archive Video Goto Archive Editorials Goto Archive Free Magazines Goto Archive Newsletter

News Archive