Applied Materials Launches Breakthrough Single-Wafer High-Current Quantum X Implanter

Applied Materials, Inc. today introduced its breakthrough Applied Quantum(TM) X ion implanter, a single-wafer high-current system that enables transistor scaling to the 65nm node and beyond. The Quantum X system's high tilt (up to 60 degrees) and true zero degree implant capability, together with its precise energy control and low defect levels, provide semiconductor manufacturers with the process technology needed to achieve optimum transistor performance for next-generation devices. The Quantum X system also redefines implant productivity; its fast beam tuning and single-wafer processor deliver 30% higher productivity than existing high current implanters.