SEMATECH and Exitech to Develop the World’s First Ultra High Numerical Aperture 193 nm Immersion Lithography Tool

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Austin, Texas and Oxford, England (7 July 2004) -- International SEMATECH and Exitech have announced an agreement to develop the world’s first ultra high numerical aperture (NA = 1.3) 193 nm wavelength immersion lithography tool. This groundbreaking microexposure tool, the MS 193i, will help speed the development of critical infrastructure for immersion lithography at SEMATECH’s Immersion Technology Center in Austin, Texas.


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