Epson, JSR Develop World's First High-Quality Silicon Film and TFTs Using Micro-Liquid Processes

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Sample SEM (scanning electron microscope) photo.
Sample SEM (scanning electron microscope) photo.

Seiko Epson Corp. and JSR have succeeded in creating the world's first high-quality silicon film with liquid coating and inkjet patterning processes. The performance of low-temperature polysilicon thin-film transistors (LTPS-TFTs) produced with silicon film formed by the spin coat method is comparable to that achieved when using silicon film formed using the conventional CVD method. The new technology is featured in the UK scientific journal Nature (April 6, 2006 issue).


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