Texas Instruments Breaks 65nm Leakage Power Barrier with SmartReflex Technologies

The potential for leakage power or battery life drain increases dramatically as the industry advances to smaller process node geometries, a challenge that has been viewed as a barrier for developing high-speed, high-integration, low-power 65nm mobile devices. Texas Instruments announced today it has solved the 65nm leakage power challenge for mobile devices with its SmartReflex power and performance management technologies, opening the door for new wireless entertainment, communications and connectivity applications in advanced mobile devices.