Making a good impression: Nanoimprint lithography tests at NIST

User rating: 3.9 / 5 after 8 vote(s)

Electron micrograph shows a cross-section of a typical SOG microcircuit feature. Nanoporous regions in the interior are lighter. The process forms a dense stronger skin about 2 nanometers thick on the outside. (Color added for clarity.) Credit: NIST
Electron micrograph shows a cross-section of a typical SOG microcircuit feature. Nanoporous regions in the interior are lighter. The process forms a dense, stronger skin about 2 nanometers thick on the outside. (Color added for clarity.) Credit: NIST

In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology have helped resolve two important questions about an emerging microcircuit manufacturing technology called nanoimprint lithography—yes, it can accurately stamp delicate insulating structures on advanced microchips, and, no, it doesn’t damage them, in fact it makes them better.


Full story »
All News summaries from Nanotechnology news
All News summaries for April 29, 2008
Goto Archive PhysOrg Forum Goto Archive Video Goto Archive Editorials Goto Archive Free Magazines Goto Archive Newsletter

News Archive