UMC Enhances 90-nm Manufacturability Using Synopsys' Phase Shift Technology

Synopsys, Inc., a world leader in semiconductor design software, and UMC a world leading semiconductor foundry, today announced that UMC is using Synopsys' alternating aperture phase-shift mask (AA-PSM) technology to enhance manufacturability for its 90-nanometer (nm) process. Manufacturability improvements are obtained through increased lithography resolution, a larger process window, and better performance enabled by the AA-PSM technology. UMC can now deliver the benefits of AA-PSM to those customers developing high-performance and low-power integrated circuits on 90-nm technology.