Significant Achievements in Intel's EUV Lithography Program
User rating: not rated yet
Intel Corporation today revealed two significant milestones in the development of extreme-ultraviolet (EUV) lithography, a technology for making future microprocessors. The company installed the world's first commercial EUV lithography tool and set up an EUV mask pilot line, marking the move of this technology out of research and into the development phase.
Full story »

PhysOrg Forum
Video
Editorials
Free Magazines
Newsletter
Goto Archive
Suggest a story idea
Send feedback