Researchers develop detailed design rules for nanoimprint lithography processing

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Georgia Tech graduate student Andrew Cannon shows a plastic sheet containing micro-mechanical features. Photo: Gary Meek
Georgia Tech graduate student Andrew Cannon shows a plastic sheet containing micro-mechanical features. Photo: Gary Meek

Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography in patterning integrated circuits and other small-scale structures into polymers.


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All News summaries for April 24, 2006