http://www.physorg.com/ en-us Physorg.com internet news portal provides the latest news on science including: Physics, Nanotechnology, Life Sciences, Space Science, Earth Science, Environment, Health and Medicine. Toshiba Corporation today announced a cost-effective 32nm CMOS platform technology that offers higher density and improved performance while halving the cost per function from 45nm technology. http://www.physorg.com/news148843305.html Technology Thu, 18 Dec 2008 17:21:45 EST news148843305 AMD, working together with its research partner, IBM, announced it has produced a working test chip utilizing Extreme Ultra-Violet (EUV) lithography for the critical first layer of metal connections across the entire chip. http://www.physorg.com/news123256413.html Technology Tue, 26 Feb 2008 13:53:33 EST news123256413 ASML Holding NV and Carl Zeiss SMT today announce that each has signed an agreement with Canon for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to manufacture integrated circuits, or chips. http://www.physorg.com/news117465405.html Technology Fri, 21 Dec 2007 13:16:45 EST news117465405 Texas Instruments said Monday it had developed a 45-nanometer wet lithography process that doubles the number of chips it can produce on a silicon wafer. http://www.physorg.com/news69337824.html Technology Mon, 12 Jun 2006 13:30:24 EST news69337824 Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology. http://www.physorg.com/news177697613.html Technology Tue, 17 Nov 2009 16:27:55 EST news177697613 A new computer chip lithography method under development at Rochester Institute of Technology has led to imaging capabilities beyond that previously thought possible. http://www.physorg.com/news10755.html Technology Fri, 10 Feb 2006 11:38:19 EST news10755 IMEC showed in collaboration with ASML the potential of double patterning 193nm immersion lithography at 1.2NA for 32nm node Flash and logic. http://www.physorg.com/news80410095.html Technology Wed, 18 Oct 2006 17:08:15 EST news80410095 IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML`s full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied Materials, using its most advanced deposition systems, was key to fabricating the ultra-small circuit structures. IMEC also completed the integration and site acceptance test of the EUV ADT in its 300mm clean room. http://www.physorg.com/news135270280.html Technology Mon, 14 Jul 2008 16:04:40 EST news135270280 In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology have helped resolve two important questions about an emerging microcircuit manufacturing technology called nanoimprint lithography -yes, it can accurately stamp delicate insulating structures on advanced microchips, and, no, it doesn`t damage them, in fact it makes them better. http://www.physorg.com/news128707959.html Nanotechnology Tue, 29 Apr 2008 17:12:39 EST news128707959 MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over larger areas than have been possible with other methods. http://www.physorg.com/news134743399.html Nanotechnology Tue, 08 Jul 2008 13:43:19 EST news134743399 A breakthrough discovery at UC San Diego may help aid the semiconductor industry`s quest to squeeze more information on chips to accelerate the performance of electronic devices. So far, the semiconductor industry has been successful in its consistent efforts to reduce feature size on a chip. Smaller features mean denser packing of transistors, which leads to more powerful computers, more memory, and hopefully lower costs. http://www.physorg.com/news134839193.html Technology Wed, 09 Jul 2008 16:19:53 EST news134839193 U.S. scientists have created a new method of rapidly engineering complex micro-scale patterns and 3D microstructures from biocompatible proteins. http://www.physorg.com/news90169892.html Chemistry Thu, 08 Feb 2007 15:11:32 EST news90169892 Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL) -pushing the technology another significant step toward readiness for advanced manufacturing. http://www.physorg.com/news121963804.html Technology Mon, 11 Feb 2008 14:50:04 EST news121963804 Researchers at Rensselaer Polytechnic Institute and Polyset Company have developed a new inexpensive, quick-drying polymer that could lead to dramatic cost savings and efficiency gains in semiconductor manufacturing and computer chip packaging. http://www.physorg.com/news120756427.html Nanotechnology Mon, 28 Jan 2008 15:27:07 EST news120756427 (PhysOrg.com) -- `In photonic crystals, the ability to control the structure of a material in full three dimensional space, allows you to control the way that light flows through it,` John Rogers tells PhysOrg.com. `This approach to photonic materials can be useful in applications ranging from communications to lasers to optical waveguides.` http://www.physorg.com/news151758574.html Physics Wed, 21 Jan 2009 11:10:25 EST news151758574