Search results for lithography:
Toshiba develops cost-effective 32nm CMOS platform technology by advanced single exposure lithography
Dec 18, 2008 |
5 / 5 (1) |
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Toshiba Corporation today announced a cost-effective 32nm CMOS platform technology that offers higher density and improved performance while halving the cost per function from 45nm technology.
AMD, Partners Produce Test Chip Using EUV Lithography
Feb 26, 2008 |
4.3 / 5 (21) |
4
AMD, working together with its research partner, IBM, announced it has produced a working test chip utilizing Extreme Ultra-Violet (EUV) lithography for the critical first layer of metal connections across the entire chip. ...
ASML, Zeiss and Canon Cross-license Lithography Equipment Patent Portfolios
Dec 21, 2007 |
3 / 5 (1) |
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ASML Holding NV and Carl Zeiss SMT today announce that each has signed an agreement with Canon for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to ...
TI developes 45-nm chip production process
Jun 12, 2006 |
2.7 / 5 (3) |
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Texas Instruments said Monday it had developed a 45-nanometer wet lithography process that doubles the number of chips it can produce on a silicon wafer.
Breakthrough Computer Chip Lithography Method Developed at RIT
Feb 10, 2006 |
4.6 / 5 (44) |
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A new computer chip lithography method under development at Rochester Institute of Technology has led to imaging capabilities beyond that previously thought possible.
IMEC demonstrates feasibility of double patterning immersion litho for 32nm node
Oct 18, 2006 |
3.8 / 5 (13) |
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IMEC showed in collaboration with ASML the potential of double patterning 193nm immersion lithography at 1.2NA for 32nm node Flash and logic.
IMEC reports major progress in EUV
Jul 14, 2008 |
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1
IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML’s full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied Materials, ...
Making a good impression: Nanoimprint lithography tests at NIST
Nanotechnology / Nanomaterials
Apr 29, 2008 |
3.9 / 5 (8) |
6
In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology have helped resolve two important questions about an emerging microcircuit ...
Researchers report finer lines for microchips: Advance could lead to next-generation computer chips, solar cells
Jul 08, 2008 |
4.5 / 5 (47) |
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MIT researchers have achieved a significant advance in nanoscale lithographic technology, used in the manufacture of computer chips and other electronic devices, to make finer patterns of lines over larger ...
Intel, Corning to Develop Extreme Ultraviolet Photomask Substrates for 32nm Node
Jul 06, 2005 |
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Intel Corporation and Corning Incorporated have entered into an agreement to develop ultra low thermal expansion ULE glass photomask substrates required for Extreme Ultraviolet (EUV) lithography technology. These substrates are needed to develop low defect EUV photoma ...
Researchers Create Enhanced Light Sources For Lithography
Jul 09, 2008 |
1.8 / 5 (33) |
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A breakthrough discovery at UC San Diego may help aid the semiconductor industry’s quest to squeeze more information on chips to accelerate the performance of electronic devices. So far, the semiconductor ...
New microfabrication technology announced
Feb 08, 2007 |
4.8 / 5 (4) |
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U.S. scientists have created a new method of rapidly engineering complex micro-scale patterns and 3D microstructures from biocompatible proteins.
SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal
Feb 11, 2008 |
1.5 / 5 (2) |
4
Technologists at SEMATECH have successfully demonstrated world-class results in low defect density for mask blanks used in extreme ultraviolet lithography (EUVL)—pushing the technology another significant step toward readiness ...
New polymer could improve semiconductor manufacturing, packaging
Nanotechnology / Nanomaterials
Jan 28, 2008 |
4.4 / 5 (19) |
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Researchers at Rensselaer Polytechnic Institute and Polyset Company have developed a new inexpensive, quick-drying polymer that could lead to dramatic cost savings and efficiency gains in semiconductor manufacturing ...
Fabricating 3D Photonic Crystals
Jan 21, 2009 |
4.3 / 5 (8) |
1
(PhysOrg.com) -- “In photonic crystals, the ability to control the structure of a material in full three dimensional space, allows you to control the way that light flows through it,” John Rogers tells PhysOrg.com. “This ...
