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Toshiba Develops High Performance CMOS Device Technology for 20nm Generation LSI

Toshiba Develops High Performance CMOS Device Technology for 20nm Generation LSI

Technology / Semiconductors

22 hours ago | 5 / 5 (1) | 0

(PhysOrg.com) -- Toshiba Corporation today announced that it has developed a breakthrough technology for steep channel impurity distribution that delivers a solution to a key problem for 20nm generation CMOS ...

List of search results for arsenic

Does weak equivalence break down at the quantum level?, Dec 08, 2009 | 4.5 / 5 (24) | 16
Scientists Generate Black Hole Radiation in the Lab, Dec 07, 2009 | 4.2 / 5 (24) | 6
Using lasers to cool and manipulate molecules, Dec 07, 2009 | 5 / 5 (8) | 0
Researchers Build Artificial Immune System to Solve Computational Problems, Dec 03, 2009 | 4.8 / 5 (13) | 0
Physics Model Determines Dynamics of Friends and Enemies, Dec 02, 2009 | 4.4 / 5 (13) | 6

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