News tagged with asml
ASML returns to profit in third quarter, orders up
Oct 14, 2009 |
5 / 5 (1) |
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(AP) -- ASML Holding NV, a key supplier to computer chip makers, reported Wednesday a net profit of euro20 million ($29.7 million) for the third quarter, ending a nine-month streak of losses, and said new orders had increased ...
'Collapse' in semiconductor demand hits ASML
Jul 15, 2009 |
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Dutch computer chip equipment maker ASML announced net losses for the first quarter after a collapse in sales, but said it saw signs of improving market conditions.
'Collapse' in semiconductor demand hits ASML
Apr 15, 2009 |
4.3 / 5 (3) |
2
Dutch computer chip equipment maker ASML on Wednesday announced net losses for the first quarter after a collapse in sales, but said it saw signs of improving market conditions.
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ASML, Zeiss and Canon Cross-license Lithography Equipment Patent Portfolios
Dec 21, 2007 |
3 / 5 (1) |
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ASML Holding NV and Carl Zeiss SMT today announce that each has signed an agreement with Canon for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to ...
ASML Ships TWINSCAN XT:1900i Lithography System for Volume Production
Jul 18, 2007 |
4.8 / 5 (5) |
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ASML today announced that it has shipped its first TWINSCAN XT:1900i, the world’s only lithography system capable of imaging features down to 36.5 nanometers (nm) on chips manufactured in volume. Production of the XT:1900i ...
ASML Introduces the Industry's Highest NA Immersion Tool for Volume Chip Production at 45 nm Node
Jul 13, 2005 |
2 / 5 (1) |
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ASML Holding NV (ASML) today announced a new lithography system with the highest numerical aperture (NA) – 1.2 – in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of volume ...
ASML Impacts Industry Roadmap with Immersion and EUV Achievements for 45 nm and Beyond
Dec 06, 2005 |
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ASML Holding NV today announced significant progress towards development of both high NA immersion and Extreme Ultra Violet (EUV) lithography technology: two critical elements of the semiconductor industry’s ability to continue ...
Micron Technology, ASML MaskTools Enter Broad Collaboration Agreement
Sep 15, 2004 |
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ASML MaskTools, a business unit of ASML Holding NV (ASML), and Micron Technology, Inc., today announced a comprehensive multi-year business agreement to enhance the capability of lithography tools. The agreement focuses on low ...
IMEC demonstrates feasibility of double patterning immersion litho for 32nm node
Oct 18, 2006 |
3.8 / 5 (13) |
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IMEC showed in collaboration with ASML the potential of double patterning 193nm immersion lithography at 1.2NA for 32nm node Flash and logic.
Governor Announces New $400 Million ASML and IBM
Jan 06, 2005 |
1 / 5 (1) |
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Governor George E. Pataki today, in his 11th Annual State of the State Message, announced that ASML Holding NV and IBM Corporation create a $400 million nanochip research and development at the Albany Center of Excellence ...
IMEC reports major progress in EUV
Jul 14, 2008 |
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1
IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML’s full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied Materials, ...
AMD, Partners Produce Test Chip Using EUV Lithography
Feb 26, 2008 |
4.4 / 5 (22) |
4
AMD, working together with its research partner, IBM, announced it has produced a working test chip utilizing Extreme Ultra-Violet (EUV) lithography for the critical first layer of metal connections across the entire chip. ...
Albany NanoTech Pioneers 193nm Immersion Lithography R&D with ASML, IBM, TEL, AMD and Infineon
Aug 26, 2004 |
3 / 5 (4) |
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Albany NanoTech of the University at Albany-State University of New York announced today that its College for Nanoscale Science and Engineering (CSNE) has installed and begun qualifying for 300mm wafers using the world’s ...
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