Spreading focus for better imaging

Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead ...

The exceptional origin of EUV light in hot tin plasma

Extreme ultraviolet light (EUV light) does not naturally occur on Earth, but it can be produced. In nanolithography machines, EUV light is generated using an immensely hot tin plasma. Researchers at ARCNL, in close collaboration ...

Rising microchip-maker demand boosts ASML profits

Dutch global hi-tech bellwether ASML Wednesday posted a huge hike in second quarter profits, after the technology industry snapped up more of its sophisticated microchip-making machines than expected.

Imec pushes the limits of EUV lithography single exposure

Imec, the world-leading research and innovation hub in nanoelectronics and digital technology, continues to advance the readiness of EUV lithography with particular focus on EUV single exposure of Logic N5 metal layers, and ...

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