News tagged with fabrication process
Breaking Down the Barrier for Smaller, Faster Electronic Devices
Oct 05, 2009 |
4.2 / 5 (5) |
0
(PhysOrg.com) -- A team of international researchers is the first to uncover the chemical composition and structure of a microelectronics element that is vital to producing ever smaller - and, thus, cheaper ...
Fabricating 3D Photonic Crystals
Jan 21, 2009 |
4.3 / 5 (8) |
1
(PhysOrg.com) -- “In photonic crystals, the ability to control the structure of a material in full three dimensional space, allows you to control the way that light flows through it,” John Rogers tells PhysOrg.com. “This ...
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USC's 'print-a-house' construction technology
Aug 28, 2008 |
4.4 / 5 (37) |
4
Caterpillar, the world's largest manufacturer of construction equipment, is starting to support research on the "Contour Crafting" automated construction system that its creator believes will one day be able ...
Samsung Begins World's First 60nm-DRAM Mass Production
Mar 02, 2007 |
3.4 / 5 (5) |
0
Samsung Electronics announced today that it has begun mass producing the industry’s first 1Gigabit (Gb) DDR2 DRAM (dynamic random access memory) using 60 nanometer (nm)–class process technology.
Researchers redefine ultrathin display process
Jul 29, 2008 |
4.8 / 5 (14) |
1
(PhysOrg.com) -- The Flexible Display Center at Arizona State University has developed a new process for manufacturing high-performance flexible displays on transparent plastic.
Breakthrough for carbon nanotube materials
Nanotechnology / Nanomaterials
Sep 29, 2008 |
4.5 / 5 (84) |
15
(PhysOrg.com) -- In collaboration with scientists from the NanoTech Institute of the University of Texas at Dallas (UTD) – CSIRO has achieved a major breakthrough in the development of a commercially-viable ...
Toshiba Develops High Performance CMOS Device Technology for 20nm Generation LSI
Dec 09, 2009 |
5 / 5 (3) |
0
(PhysOrg.com) -- Toshiba Corporation today announced that it has developed a breakthrough technology for steep channel impurity distribution that delivers a solution to a key problem for 20nm generation CMOS ...
HP Licenses Technology to Create Nanoscale Electronic Devices
May 02, 2007 |
4.2 / 5 (10) |
0
HP today announced that it is beginning to reap returns from its 10-year investment in nanoscale electronics with the licensing of technology that could enable the fabrication of semiconductor chips significantly more powerful ...
Toshiba develops molecular photoresist technology for EUV lithography
Nov 17, 2009 |
1.9 / 5 (17) |
1
Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, ...
TSMC Unveils First Commercial 65-Nanometer Multi-Time Programmable Non-Volatile Memory Technology
Jul 02, 2009 |
5 / 5 (1) |
1
Taiwan Semiconductor Manufacturing Company today announced the foundry segment’s first functional 65-nanometer multi-time programmable (MTP) non-volatile memory (NVM) process technology.
Precise Alignment to Quantum Dots
May 12, 2008 |
4.7 / 5 (33) |
0
“Precise lithographic alignment to site-controlled quantum dots is of major importance for numerous nano-photonic, nano-electronic and nano-spintronic devices,” Sven Höfling tells PhysOrg.com.
New process makes nanofibers in complex shapes and unlimited lengths
Nanotechnology / Nanomaterials
Jan 30, 2008 |
4.9 / 5 (35) |
4
The continuous fabrication of complex, three-dimensional nanoscale structures and the ability to grow individual nanowires of unlimited length are now possible with a process developed by researchers at the University of ...
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