News tagged with photoresist
Electronics from the printer
Jan 05, 2009 |
4.7 / 5 (3) |
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(PhysOrg.com) -- Electronic systems designed to perform simple functions, such as monitor the temperature on a yogurt pot, mustn’t cost much: This is where printed electronics are at an advantage. Researchers ...
Search results for photoresist
Toshiba develops molecular photoresist technology for EUV lithography
Nov 17, 2009 |
2.2 / 5 (13) |
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Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, ...
New paper reveals nanoscale details of photolithography process
Dec 12, 2007 |
4.7 / 5 (6) |
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Scientists at the National Institute of Standards and Technology have made the first direct measurements of the infinitesimal expansion and collapse of thin polymer films used in the manufacture of advanced ...
Exposing the Sensitivity of Extreme Ultraviolet Photoresists
Jun 26, 2008 |
3 / 5 (5) |
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Researchers at the National Institute of Standards and Technology (NIST) have confirmed that the photoresists used in next-generation semiconductor manufacturing processes now under development are twice as ...
Assembly technique for tiny wires may help detect cancer, other diseases
Nanotechnology / Bio & Medicine
Mar 07, 2008 |
4.3 / 5 (7) |
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Bottom-up manufacturing may hold the key to production of tiny medical devices capable of testing for multiple molecules like viruses or cancer markers, according to an interdisciplinary team of Penn State researchers.
Denser computer chips possible with plasmonic lenses that 'fly'
Oct 22, 2008 |
4.4 / 5 (31) |
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(PhysOrg.com) - Engineers at the University of California, Berkeley, are reporting a new way of creating computer chips that could revitalize optical lithography, a patterning technique that dominates modern ...
Scientists build world's first nanofluidic device with complex 3-D surfaces
Nanotechnology / Bio & Medicine
Mar 31, 2009 |
4.8 / 5 (12) |
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(PhysOrg.com) -- Researchers at the Commerce Department's National Institute of Standards and Technology (NIST) and Cornell University have capitalized on a process for manufacturing integrated circuits at ...
Magnetism shepherds microlenses to excavate 'nanocavities'
Mar 30, 2006 |
5 / 5 (1) |
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A Duke University engineer is "herding" tiny lenses with magnetic ferrofluids, precisely aligning them so that they focus bursts of light to excavate patterns of cavities on surfaces. Such photolithographically ...
Faster Nanochannels Water Transport with Sharp Corners
Jan 04, 2006 |
4.1 / 5 (17) |
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A new study has revealed how sharp corners in nanochannels can speed up the drying rate of liquid water and in turn, transport water faster. "As far as we know, nobody else has realized this gain in water-transport speed," ...
Solutions Emerging for Wafer Cleaning at 45 nm and Beyond
May 21, 2007 |
5 / 5 (1) |
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Potential solutions are starting to emerge for preparing wafers for manufacturing at and beyond the 45 nm technology generation, technologists indicated at a recent industry meeting organized by SEMATECH.
IKONICS Announces New RapidMask Film
Jul 21, 2004 |
not rated yet |
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IKONICS Corporation, a Duluth based imaging technology company, announced today the introduction of a new product to its successful RapidMask(TM) line of photoresist films. RapidMask(TM) High Tack opens up new markets to ...
List of search results for photoresist
