Electrons give resist layer electrical charge

Leiden physicists found a surprising interaction between electrons and a resist layer. The resist appears to charge and discharge due to incoming electrons. Publication in Physical Review Letters.

Saturn's radiation belts: A stranger to the solar wind

The radiation belts of Earth and Saturn differ more strongly than previously assumed. In these belts, very energetic particles, such as electrons and protons, move around the planet at high velocities - captured by its magnetic ...

EUV calibrations for satellite sensors

Thanks to precision calibration measurements recently performed at NIST, satellites may soon be looking at sunlight with new and improved vision.

Higher dose sensitivity progress in novel photoresist platforms

SEMATECH announced today that researchers have reported progress which could significantly improve resist sensitivity by incorporating metal oxide nanoparticles for extreme ultraviolet (EUV) lithography, bringing the technology ...

SDO/EVE calibration sounding rocket launch

The Solar Dynamics Observatory (SDO) was launched on 11 February 2010, and the EUV Variability Experiment (EVE), one of the three solar instruments aboard SDO, began normal operations on 1 May 2010.

Imec releases industry’s first 14nm process development kit

Imec today announces that it has released an early-version PDK (process development kit) for 14nm logic chips. This PDK is the industry’s first to address the 14nm technology node. It targets the introduction of a number ...

Plasma etching pushes the limits of a shrinking world

Plasma etching (using an ionized gas to carve tiny components on silicon wafers) has long enabled the perpetuation of Moore's Law -- the observation that the number of transistors that can be squeezed into an integrated circuit ...

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